Production Sputtering Systems
SVS offer a wide range of sputtering systems for production applications, for processing multiple small wafers to 1 metre square substrates.
If you are looking for a sputtering system, SVS are experts with in-house design capability to manufacture a system to meet your process requirements.
The V2000 series are offered in the following sputtering configurations:
V2000
V2400
V2600
V2800
V2900
V2000 Series Options
Wet/Dry 1st stage pumping (application dependent).
Turbo or Cryo pumps for high vacuum stages.
DC (straight & pulsed), RF Sputtering and co-deposition.
Substrate heating/cooling.
High accuracy multiple process gas-admittance system.
Ion assisted deposition.
All systems are clean room compatible.
Substrate etch & bias (RF/DC).
Wide range of substrate sizes from 3-inch wafers to 1 metre square panels.
Automated Loadlock entry systems.
All systems are controlled by a PLC based Control System, via a built-in industrial PC or Human-Machine Interface (HMI).
Data logging of all major process parameters.