Production Sputtering

SVS offers a wide range of sputtering equipment for production facilities.

The V2000 series can be designed for the following sputtering configurations:

• Sideways (V2000)
• Sputter down (V2400)
• Sputter up (V2600)
• Single loadlock sputter system (V2800)
• Inline double loadlock sputter system (V2900)

Each system is individually designed around the needs of the end user. The systems take advantage of the latest technology, with a wide range of available options:

• Wet/Dry 1^st stage pumping (application dependent)
• Turbo or Cryo pumps for high vacuum stages
• DC (straight & pulsed) & RF magnetrons for high uniformity & usage coating
• Wide range of substrate holding & heating
• High accuracy gas-admittance system (for refractory & reactive sputtering).
• Ion assisted deposition
• Substrate etch & bias (RF/DC)

Each system is also available with a loadlock option (V2800). All systems are clean room compatible.

All systems are controlled by a PLC based Control System, via a built-in industrial PC or Human-Machine Interface (HMI).