Products
Sputtering
The V2000 range of magnetron sputtering systems includes the V2000 (side sputter), V2400 (sputter down), V2600 (sputter up), V2800 (loadlock sputter) and V2900 (inline sputter). Substrate size capability can range from a single 3 inch Si and GaAs wafers to multiple 1m2 panels. The V2000 range of sputtering systems caters for both R & D to full production environments, encompassing the technological fields of D.C, Reactive D.C Pulse, R.F sputtering/etching, PECVD, Ion Beam assisted deposition, milling and cleaning.
Evaporation
To complement the SVS range of sputter systems there is the E2000 range of electron beam and thermal evaporation Systems for both R & D and production coating applications. Options include multi-hearth electron beam guns, multiple electron and thermal sources, reactive deposition, ion gun cleaning and assisted deposition, planetary rotation, substrate heating and cooling, film thickness/rate control and full system automation.
Precision Optics
The latest range of systems to be introduced by SVS are the Prism electron beam and Spectrum reactive sputter deposition systems, both addressing the precision optical coating market. Each range of systems are offered in a variety of sizes and capacities and offer the latest in deposition techniques from dual magnetron reactive sputtering to high density ion assisted electron beam evaporation.
Research
The V6000 range of systems are aimed at universities and research laboratories, and are scaled down versions of our production systems.